JPH058673Y2 - - Google Patents

Info

Publication number
JPH058673Y2
JPH058673Y2 JP19454887U JP19454887U JPH058673Y2 JP H058673 Y2 JPH058673 Y2 JP H058673Y2 JP 19454887 U JP19454887 U JP 19454887U JP 19454887 U JP19454887 U JP 19454887U JP H058673 Y2 JPH058673 Y2 JP H058673Y2
Authority
JP
Japan
Prior art keywords
substrate
work holder
end plate
inner work
center hole
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP19454887U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0197547U (en]
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP19454887U priority Critical patent/JPH058673Y2/ja
Priority to KR1019890700595A priority patent/KR930003136B1/ko
Priority to EP88908981A priority patent/EP0336979B1/en
Priority to PCT/JP1988/001043 priority patent/WO1989003587A1/ja
Priority to US07/368,312 priority patent/US4991542A/en
Publication of JPH0197547U publication Critical patent/JPH0197547U/ja
Application granted granted Critical
Publication of JPH058673Y2 publication Critical patent/JPH058673Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Chemical Vapour Deposition (AREA)
JP19454887U 1987-10-14 1987-12-22 Expired - Lifetime JPH058673Y2 (en])

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP19454887U JPH058673Y2 (en]) 1987-12-22 1987-12-22
KR1019890700595A KR930003136B1 (ko) 1987-10-14 1988-10-14 프라즈마 cvd에 의한 박막 형성장치
EP88908981A EP0336979B1 (en) 1987-10-14 1988-10-14 Apparatus for thin film formation by plasma cvd
PCT/JP1988/001043 WO1989003587A1 (en) 1987-10-14 1988-10-14 Method and apparatus for thin film formation by plasma cvd
US07/368,312 US4991542A (en) 1987-10-14 1988-10-14 Method of forming a thin film by plasma CVD and apapratus for forming a thin film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19454887U JPH058673Y2 (en]) 1987-12-22 1987-12-22

Publications (2)

Publication Number Publication Date
JPH0197547U JPH0197547U (en]) 1989-06-29
JPH058673Y2 true JPH058673Y2 (en]) 1993-03-04

Family

ID=31485274

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19454887U Expired - Lifetime JPH058673Y2 (en]) 1987-10-14 1987-12-22

Country Status (1)

Country Link
JP (1) JPH058673Y2 (en])

Also Published As

Publication number Publication date
JPH0197547U (en]) 1989-06-29

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